Discover
.svg){kind=icon}
Sheet-to-Sheet Processing Platform
High-speed, precise coatings for large scale applications.
Our sheet-to-sheet platform employs our PlasmaShieldTM technology along with linear substrate movement to deposit one to five ALD cycles with each pass of the substrate, with up to 5 cycles per second for large area sheet processing.
Simple Precursor Isolation
The PlasmaShieldTM sources are autonomously isolated, preventing CVD interaction event with multi-millimeter spacing between the plasma array and the substrate, while the precursor vapor occupies the rest of the reaction space.
Low Particle Generation
We use magnetics to couple the substrate carrier inside the chamber to the linear drive system outside the chamber, assuring there is no particle generation source above the plane of the substrate surface.
High Thruput
Our substrate motion scheme allows rapid acceleration and deceleration, providing up to one full pass per second.
Efficient Precursor Utilization
Because the precursor flow is not directed and isolated, the residence time is substantially increased, providing conformality without massive overdosing.
Efficient large-area coating.
High speed ALD on large area sheets, up to multi-meter scale
Elegant, uncomplicated coating head
Clean and simple process
ALD at angstroms per second.
Our approach to large area sheet processing enables a straightforward way to provide precursor/reaction separation on large areas at high speed.
Scalable and flexible approaches.
This plasma technology readily scales to multi-meter lengths without compromising speed or uniformity. For barrier films, we can coat an OLED-quality vapor barrier on display-sized sheets in about one minute.
View Our Technology
01.
Vortex ALD
A rotary batch technology that uses rotation of a disc or cylinder to transport substrates.
02.
TransFlex
High-speed, low-cost Roll-to-Roll ALD that weaves a flexible substrate through separate precursor regions.
03.
Rapid Thermal ALD
Uses a “flash” of temperature to convert the chemisorbed precursor to the final coating product.
04.
Sheet-to-Sheet
Deposit 1-5 ALD cycles with each pass of the substrate, with up to 5 cycles per second for large area sheet processing.
05.
PlasmaShield
Highly localized plasma source with a deactivation shroud for suspended operation in precursor-filled chambers.
06.
In-Line Roll to Roll
A flexible Roll-to-Roll platform for moderate speed PEALD with straightforward web handling.
Resources
Explore blog articles on ALD innovations, market trends, and case studies plus industry news shaping the future of thin-film deposition.
