Discover
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TransFlex™
Roll-to-Roll ALD
Continuous, simplified processing.
TransFlex™ Roll to Roll technology is a fast Roll to Roll ALD coating method that achieves high-speed, low cost deposition by weaving the flexible substrate back and forth between physically separated precursor regions.
Continuous
Processing
Web speeds of up to 10 meters per second.
Simplified Processing
and Maintenance
The web surface is the only surface that "sees" both reactants.
High
Precursor Utilization
TransFlex ALD avoids the wasted precursor associated with conventional coating “heads”.
Film Properties of Conventional ALD
Ideal for various commercial & industrial applications
By far the fastest roll to roll ALD coating method ever demonstrated.
Unmatched for processing speed and cost
High speed ultra barrier coatings demonstrated in a single pass on PET
Continuous Roll to Roll processing at speeds up to 10 meters per second
Achieve high speed, low cost deposition in a remarkably simple way.
We weave the flexible substrate back and forth between physically separated precursor regions. This geometry allows extended path lengths for the substrate in each of the reaction zones, allowing web speeds orders of magnitude faster than can be achieved in Spatial ALD reactors utilizing coating “heads”.
Large Passageways, Low Temperatures, High Speed
Operating under medium vacuum like conventional ALD, precursor separation is maintained by differential pressure and pumping, enabling millimeter-wide passageways for the substrate. In contrast, atmospheric pressure Spatial ALD requires micron-scale gaps to prevent mixing. Using a simple DC direct plasma instead of water as the oxygen precursor allows for very high web speeds, even at low temperatures.
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View Our Technology
01.
Vortex ALD
A rotary batch technology that uses rotation of a disc or cylinder to transport substrates.
02.
TransFlex
High-speed, low-cost Roll-to-Roll ALD that weaves a flexible substrate through separate precursor regions.
03.
Rapid Thermal ALD
Uses a “flash” of temperature to convert the chemisorbed precursor to the final coating product.
04.
Sheet-to-Sheet
Deposit 1-5 ALD cycles with each pass of the substrate, with up to 5 cycles per second for large area sheet processing.
05.
PlasmaShield
Highly localized plasma source with a deactivation shroud for suspended operation in precursor-filled chambers.
06.
In-Line Roll to Roll
A flexible Roll-to-Roll platform for moderate speed PEALD with straightforward web handling.
Resources
Explore blog articles on ALD innovations, market trends, and case studies plus industry news shaping the future of thin-film deposition.
