Discover
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Revolutionizing ALD. Staying True to Our Roots.
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From cutting-edge coatings to collaborative research, LotusAT is where deep expertise meets honest innovation.
A Legacy of ALD Innovation
WHO WE ARE
Lotus Applied Technology was built by scientists who’ve been shaping ALD since the early ’90s and we’re still pushing boundaries today.
With roots in Planar Systems and experience going back to 1992, we’ve spent decades advancing thin film deposition, working with everything from phosphors to dielectrics to ultra-thin barriers. We stepped out as an independent R&D lab in 2007 to stay focused on what matters: breakthrough technology, collaborative research, and integrity in everything we do.
Our Mission & Values
Our mission is to revolutionize global manufacturing with the fastest, most cost-effective ALD technology while retaining what matters most:
Honest Innovation
Smart Partnerships
Creativity
Staying Independent
R&D Reimagined
We take your toughest coating problem or earliest concept and develop a real, scalable solution - tailored to your application and existing tools. We offer full-spectrum support for advanced materials R&D including:
Feasibility & proof-of-concept coatings
Custom process development
Thin film licensing and scaling
Specialized work in semiconductors, optical coatings, aerospace
Firsts That Speak for Themselves
We’ve been ahead of the curve for years - and we’re proud of where we’re going.
1995
First full-color TFEL display using ALD phosphors
2007
LotusAT spins out of Planar Systems
2011
Vortex™ rotary S-PEALD introduced
2015
First roll-to-roll ALD at 1 meter/sec
2024
PEALD coating on 20mm 3D parts at 8 Å/sec
Whether you're optimizing advanced research or scaling up production, LotusAT empowers your team with breakthrough coating performance, unmatched speed, and a smarter path to market. When precision matters, we make every layer count.
Resources
Explore blog articles on ALD innovations, market trends, and case studies plus industry news shaping the future of thin-film deposition.
